Amplification of DUV Solid-state Laser Pulse Using ArF Laser

Masaki Arakawa; Yuki Tamaru; Atsushi Fuchimukai; Yoichi Sasaki; Takashi Onose; Mitsuru Tamiya; Taisuke Miura; Tomoharu Nakazato; Shuntaro Watanabe; Takashi Matsunaga

2017 European Conference on Lasers and Electro-Optics and European Quantum Electronics Conference
(Optica Publishing Group, 2017),
paper CA_1_6

Amplification of DUV Solid-state Laser Pulse Using ArF Laser

Masaki Arakawa, Yuki Tamaru, Atsushi Fuchimukai, Yoichi Sasaki, Takashi Onose, Mitsuru Tamiya, Taisuke Miura, Tomoharu Nakazato, Shuntaro Watanabe, and Takashi Matsunaga

The European Conference on Lasers and Electro-Optics 2017

Munich Germany
25–29 June 2017
ISBN: 978-1-5090-6736-7

From the session
Novel Solid-State-Laser Concepts (CA_1)

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M. Arakawa, Y. Tamaru, A. Fuchimukai, Y. Sasaki, T. Onose, M. Tamiya, T. Miura, T. Nakazato, S. Watanabe, and T. Matsunaga, "Amplification of DUV Solid-state Laser Pulse Using ArF Laser," in 2017 European Conference on Lasers and Electro-Optics and European Quantum Electronics Conference, (Optica Publishing Group, 2017), paper CA_1_6.

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Abstract

Deep ultra violet (DUV) lasers are actively used for material micro processing and semiconductor lithography. Argon fluoride excimer laser (ArF excimer laser) is the typical light source which can generate above 100-W optical power at the wavelength of below 200-nm. Using all-solid-state DUV light source as a seed laser and amplifying by ArF excimer, both high average power and high beam quality can be realized in the DUV region [1]. In this paper, we report on the output characteristics of hybrid ArF excimer laser.

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