Abstract

One of the goals of modern optoelectronics is to find new materials for photodiodes and solar cells, to raise the quantum yield of these devices, and to control their sensitivity band. At present, nanostructured or nanoparticle silicon is a frequently used material in optoelectronics. The most promising technique for depositing granular silicon films on almost any surface is a laser electrodispersion (LED) [1]. The LED method is based on the laser ablation of silicon target and cascade fission of ejected molten droplets charged in laser torch plasma. The method makes it possible to obtain ensembles of amorphous close packed, but not coagulated nanoscale particles (nano-Si) with small size dispersion over the ensemble. The LED method also allows making mixed layers, for example, of Si and metal nanoparticles.

© 2015 IEEE