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  • 2013 Conference on Lasers and Electro-Optics - International Quantum Electronics Conference
  • (Optica Publishing Group, 2013),
  • paper CM_3LIM_3

Three-Dimensional Laser Lithography: Finer Features Faster

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Abstract

Direct laser writing is a versatile technique for the fabrication of three-dimensional nano- and microstructures and has become recently commercially available [1]. Lateral feature sizes down to 100 nm are routinely achieved due to two-photon absorption and the threshold behaviour of the photoresists. The finite numerical aperture of the objective lens used in most systems (typically NA 1.4, oil immersion) results in features which are axially elongated by more than a factor of 2.6 for conventional photoresists. This aspect ratio between axial and lateral feature size hinders small lattice constants, e.g., in the fabrication of three-dimensional photonic structures [2].

© 2013 IEEE

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