Impact of lithographic irregularity across mm-scale photonic-crystal notch filters

A. Talneau; F. Lemarchand; A. L. Fehrembach; A. Sentenac

CLEO/Europe and EQEC 2009 Conference Digest
(Optica Publishing Group, 2009),
paper CK_P6

Impact of lithographic irregularity across mm-scale photonic-crystal notch filters

A. Talneau, F. Lemarchand, A. L. Fehrembach, and A. Sentenac

The European Conference on Lasers and Electro-Optics 2009

Munich Germany
14–19 June 2009
ISBN: 978-1-4244-4080-1

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A. Talneau, F. Lemarchand, A. L. Fehrembach, and A. Sentenac, "Impact of lithographic irregularity across mm-scale photonic-crystal notch filters," in CLEO/Europe and EQEC 2009 Conference Digest, (Optica Publishing Group, 2009), paper CK_P6.

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Abstract

We investigate the impact of electronic lithography writing conditions on the performances of two-dimensional grating notch filters fabricated on SiO2/Ta2O5 stack. Field stitching errors as well as electron beam writing step are considered.

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