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Conferences > CLEO_Europe > 2009 > CK > CK_P26
  • CLEO/Europe and EQEC 2009 Conference Digest
  • (Optica Publishing Group, 2009),
  • paper CK_P26

Characterization of Deeply Etched Uniform Sidewall Gratings in InP/InGaAsP Ridge Waveguides

R. Dylewicz, R. Green, M. Sorel, A. C. Bryce, and R. M. De La Rue

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Abstract

We report on the spectral characterization of 1st order sidewall gratings with constant period of Λ = 236 nm, which were deeply etched into InP-based passive ridge waveguides. Periodic structures of this type with variable geometry (adjustable recess depth) may be used as the mirrors with well-controlled reflectivity for laser facets and intracavity reflectors, as well as in optical pulse compressors, when grating period chirp is imposed [1].

© 2009 IEEE

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