Abstract

Development of high quality oxide glass films is an integral component of fabricating hybrid photonic integrated devices. Ultrafast laser ablation was used in the past to deposit chalcogenide glass films[1] . In this paper we report for the first time the use of femtosecond laser ablation of glass target to fabricate oxide glass films. The ulatrafast laser deposition offers much larger film growth rates and less particulates comparing to excimer laser deposition. This will enable one to fabricate good optical quality glass films thicker than 1 micron for planar waveguides and photonic integrated devices.

© 2009 IEEE