Add to BibSonomyAbstract
High throughput ultrafast laser processing of bulk fused silica photomask substrate for producing DUV radiation (193 and 248 nm) attenuating 3D structures is of great importance for photomask repair and modification [1, 2], In this paper we present the method for high-speed 3D structures patterning inside the volume of photomask substrate without affecting front mask surface and absorber layer using ultrafast laser and the results of investigation of DUV radiation attenuation by created structures.
© 2007 IEEE
PDF ArticleMore Like This
T.P. Seward, C. Smith, N.F. Borrelli, D.C Allan, and R.J. Araujo
JMA.1 Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides (BGPP) 1997
C. Hnatovsky, E. Simova, P. P. Rajeev, D. M. Rayner, P. B. Corkum, and R. S. Taylor
BTuD1 Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides (BGPP) 2007
Christoph Pfleiderer, Norbert Leclere, Hermine Hitzler, Jürgen Wolfrum, Karl-Otto Greulich, Heinz Fabian, Ralf Takke, and Stephan Thomas
CMD6 Conference on Lasers and Electro-Optics (CLEO:S&I) 1991