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  • CLEO/Europe and IQEC 2007 Conference Digest
  • (Optica Publishing Group, 2007),
  • paper CJ_5

Nonlinear frequency conversion based on a fiber amplifier at 977 nm for the indium atom lithography

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Abstract

Atom lithography (AL) is one of the interesting applications in atom optics where the atomic motion is controlled by laser beam or magnetic force [1], In our group, we have focused on the AL using indium atoms which promises application in semi-conductor physics. A standing-wave light field can be used as micro-lens array to focus atoms onto a substrate. Due to the small dipole force, a well-collimated atomic beam is required for AL. The collimation can be realized by transverse laser cooling.

© 2007 IEEE

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