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Conferences > CLEO_AT > 2021 > JTu3A > JTu3A.86

Arrays of Microplasma-assisted Atomic Layer Deposition and Etching Free Patterning of Ga2O3 Thin Film with Flexible DUV Photodetector

Jinhong Kim, Andrey E. Mironov, Dane J. Sievers, Sung-jin Park, and J. Gary Eden

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Abstract

Microplasma arrays assisted atomic layer deposition (MALD) have been used to deposit gallium oxide (Ga2O3) thin film on the rigid and flexible substrate in order to fabricate deep-ultraviolet (DUV) photodetector under 254 nm illumination.

© 2021 The Author(s)

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