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Conferences > CLEO_AT > 2017 > ATh4B > ATh4B.6

Enhanced Parallel Bridge Defect Inspection Using a Metalens Assisted Off-Focus Scanning Imaging

Jinlong Zhu, Sanyogita Purandare, and Lynford L. Goddard

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Abstract

A near-field metalens is utilized to assist a conventional brightfield microscope for significantly enhancing the signal-to-noise ratio associated with a parallel bridge defect on a 7 nm node patterned wafer.

© 2017 Optical Society of America

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