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Conferences > CLEO_AT > 2016 > ATu3K > ATu3K.4

Thermal Modeling and Heat Mitigation for Femtosecond-Laser-Based Silicon Processing

Jie Qiao, Lauren L. Taylor, and Jun Qiao

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Abstract

Femtosecond laser processing of silicon has shown effective material removal, but with heat-induced formation of raised surface features. The surface heating phenomenon was simulated to optimize laser parameters for mitigating thermal effects in femtosecond processing.

© 2016 Optical Society of America

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