Abstract
GaN-based ridge waveguides with very smooth and vertical sidewalls are fabricated with combined inductively coupled plasma (ICP) etching and chemical etching. Reduction in scattering loss is estimated to be 2 dB/mm at 1.55 μm.
© 2015 Optical Society of America
PDF ArticleMore Like This
R. Zhang, Z. Ren, and S. Yu
CWL3 Conference on Lasers and Electro-Optics (CLEO:S&I) 2008
Yanzhen Zheng, Changzheng Sun, Bing Xiong, Lai Wang, Jian Wang, Yanjun Han, Zhibiao Hao, Hongtao Li, Jiadong Yu, and Yi Luo
SM4R.2 CLEO: Science and Innovations (CLEO:S&I) 2020
K. Tanaka and T. Suhara
26I1_5 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2015