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Nano-patterning based on Two-Surface-Plasmon-Polariton-Absorption using 400nm Femtosecond Laser

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Abstract

Nano-patterning with linewidth of ~55 nm is demonstrated utilizing two-surface-plasmon-polariton-absorption (TSPPA) at the wavelength of 400 nm. The SPP field generated by plasmonic mircolens is recorded by the TSPPA showing a new way for recording the SPP field in micro/nano structures.

© 2014 Optical Society of America

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Poster Presentation

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