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Deep Sub-wavelength Plasmonic Lithography with Antisymmetric Surface Plasmon Mode

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Abstract

We propose a method for deep-subwavelength patterns using antisymmetric surface plasmon mode in metal/dielectric multilayer metamaterials. Interference patterns with feature size of 22nm(~λincident/20) and fabrication of the device are demonstrated.

© 2012 Optical Society of America

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