Speed Investigations toward an Industrial Application of Optical Trap Assisted Nanopatterning

Romain Fardel; Yu-Cheng Tsai; Craig B. Arnold

doi:10.1364/CLEO_AT.2011.AMD2

CLEO:2011 - Laser Applications to Photonic Applications
OSA Technical Digest (CD) (Optica Publishing Group, 2011),
paper AMD2
•https://doi.org/10.1364/CLEO_AT.2011.AMD2

Speed Investigations toward an Industrial Application of Optical Trap Assisted Nanopatterning

Romain Fardel, Yu-Cheng Tsai, and Craig B. Arnold

CLEO: Applications and Technology 2011

Baltimore, Maryland United States
1–6 May 2011
ISBN: 978-1-55752-910-7

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Laser Micro and Nano Structuring (AMD)

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R. Fardel, Y. Tsai, and C. B. Arnold, "Speed Investigations toward an Industrial Application of Optical Trap Assisted Nanopatterning," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optica Publishing Group, 2011), paper AMD2.

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Abstract

Optical trap assisted nanopatterning is a viable method of producing parallel nanoscale features over rough surfaces and large areas. The maximum writing speed on various surfaces is elucidated to evaluate the performance of the method.

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