Abstract

In this paper, the buried grating with the period of 700nm has been fabricated by holographic-ion beam etching and ion beam polishing. Firstly, the holographic lithography is used to form a photoresist grating mask. Secondly, the grating mask is transferred into the substrate by ion beam etching. Then, the plasma enhanced chemical vapor deposition (PECVD) is used to coating the grating. Finally, the optimized ion beam polishing is used to achieve the global planarization. The results show that the ion beam polishing technique achieves the global planarization of 5.2nm roughness on the surface of the buried grating.

© 2017 Optical Society of America