Abstract
We have successfully obtained GaInAsP stripe laser grown on InP/Si substrate by MOVPE. InP/Si substrate was prepared by direct wafer bonding technique using epitaxial grown 1µm thickness InP and silicon substrate. 1.2µm wavelength GaInAsP double heterostructure laser was grown by MOVPE, and stripe laser was fabricated using standard SiO2 deposition and lithography. Room temperature lasing was obtained under pulsed condition.
© 2017 Optical Society of America
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