Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • 2017 Conference on Lasers and Electro-Optics Pacific Rim
  • (Optica Publishing Group, 2017),
  • paper s2484

Lasing characteristics of GaInAsP stripe laser integrated on InP/Si substrate

Not Accessible

Your library or personal account may give you access

Abstract

We have successfully obtained GaInAsP stripe laser grown on InP/Si substrate by MOVPE. InP/Si substrate was prepared by direct wafer bonding technique using epitaxial grown 1µm thickness InP and silicon substrate. 1.2µm wavelength GaInAsP double heterostructure laser was grown by MOVPE, and stripe laser was fabricated using standard SiO2 deposition and lithography. Room temperature lasing was obtained under pulsed condition.

© 2017 Optical Society of America

PDF Article
More Like This
1.5 μm GaInAsP Stripe Laser Comparison Between InP Substrate and Directly Bonded InP/Si Substrate

Periyanayagam Gandhi Kallarasan, Naoki Kamada, Yuya Onuki, Kazuki Uchida, Hirokazu Sugiyama, Xu Han, Natsuki Hayasaka, Masaki Aikawa, and Kazuhiko Shimomura
JTu2A.12 CLEO: Applications and Technology (CLEO:A&T) 2018

Low threshold current of GaInAsP laser grown on directly bonded InP/Si substrate

Hirokazu Sugiyama, Tetsuo Nishiyama, Naoki Kamada, Yuya Onuki, Xu Han, Gandhi Kallarasan Periyanayagam, Masaki Aikawa, Natsuki Hayasaka, Kazuki Uchida, and Kazuhiko Shimomura
s2356 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2017

Integration of GaInAsP Laser Diode on Direct-Bonded Thin Film InP-Si Substrate

Gandhi Kallarasan, Tetsuo Nishiyama, Kamada Naoki, Yuya Onuki, and Kazuhiko Shimomura
16p_C301_4 JSAP-OSA Joint Symposia (JSAP) 2016

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.