Abstract
We improved signal to noise ratio of vacuum-ultraviolet (VUV) photoconductive detector based on NdF3 thin film. We fabricated these thin films by controlling laser power irradiation of pulsed laser deposition (PLD). The signal to noise ratio of detector based on thin film fabricated by 100 mW laser power irradiation is only 1.1 at an applied bias of 100 V. On the other hand, the signal to noise ratio of detector based on thin film fabricated by 20 mW laser power irradiation is 470.
© 2017 Optical Society of America
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