Abstract

Nanoimprint lithography (NIL) has proven to be a high resolution, low-cost and high-throughput nano-pattering technique for applications in nanoelectronics, nanofluidics, nanobiology, nanophotonics and nanoplasmonics. In this paper, we review the major process in the technical development of NIL template fabrication and NIL process on SU-8 for fabricating planar photonic and plasmonic crystals.

© 2009 IEEE

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