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Conferences > CLEOPR > 2009 > WE4 > WE4_4
  • Conference on Lasers and Electro-Optics/Pacific Rim 2009
  • (Optica Publishing Group, 2009),
  • paper WE4_4

Aberration measurement of lithographic projection lens by using a translational symmetry Alt-PSM grating mark

Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, and Lifeng Duan

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Abstract

A method to design a mark with high sensitivity is proved and declared. A translational symmetry Alt-PSM grating mark is redesigned with all of the even orders, ±3rd and ±5th orders diffraction light missing.

© 2009 IEEE

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