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Optica Publishing Group
  • Conference on Lasers and Electro-Optics/Pacific Rim 2007
  • (Optica Publishing Group, 2007),
  • paper ThP_103

Mask pattern recording of reflection type photopolymer using total internal reflection

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Abstract

In this paper, recording and reconstruction of micro-pattern using total internal reflection hologram applied in reflection type photopolymer are studied. The line and point patterns with the interval of 1 μm are recorded successfully and can be observed when the micro objective lenses with 100 time magnification are used.

© 2007 IEEE

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