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  • Conference on Lasers and Electro-Optics/International Quantum Electronics Conference
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper CPDA1
  • https://doi.org/10.1364/CLEO.2009.CPDA1

Achieving Resolution Far Beyond the Diffraction Limit with RAPID Photolithography

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Abstract

A method to scale the resolution in photolithographic fabrication is introduced, in which one laser beam is used to initiate multiphoton absorption polymerization in a negative-tone photoresist while a second, phase-shaped laser beam is used to deactivate the polymerization. This approach allows for fabrication of polymeric nanostructures with λ/20 resolution.

© 2009 Optical Society of America

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