Micro- and Nanostructures inside Sapphire by fs-Laser Irradiation and Selective Etching

Dirk Wortmann; Jens Gottmann; Nelli Brandt; Herbert Horn-Solle

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
OSA Technical Digest (CD) (Optica Publishing Group, 2008),
paper CTuG4

Micro- and Nanostructures inside Sapphire by fs-Laser Irradiation and Selective Etching

Dirk Wortmann, Jens Gottmann, Nelli Brandt, and Herbert Horn-Solle

Conference on Lasers and Electro-Optics 2008

San Jose, California United States
4–9 May 2008
ISBN: 978-1-55752-859-9

From the session
Bulk Processing of Transparent Materials with Femtosecond Lasers (CTuG)

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D. Wortmann, J. Gottmann, N. Brandt, and H. Horn-Solle, "Micro- and Nanostructures inside Sapphire by fs-Laser Irradiation and Selective Etching," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest (CD) (Optica Publishing Group, 2008), paper CTuG4.

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Abstract

Micro- and nanofabrication of cavities in the volume of sapphire was performed by femtosecond laser irradiation followed by chemical etching with aqueous solution of HF acid. Depending on the focusing conditions self-organized nanostructures or elliptical microchannels are produced. This manufacturing technique is potentially usable for photonic crystals in integrated optical elements or microfluidic devices for applications in life science, biology or chemistry.

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