Mask Design for the Space Interferometry Mission Internal Metrology

David Marx; Feng Zhao; Robert Korechoff

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies
Technical Digest (CD) (Optica Publishing Group, 2005),
paper JWB1

Mask Design for the Space Interferometry Mission Internal Metrology

David Marx, Feng Zhao, and Robert Korechoff

Conference on Lasers and Electro-Optics 2005

Baltimore, Maryland United States
22–27 May 2005
ISBN: 1-55752-770-9

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Poster Session II (JWB)

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D. Marx, F. Zhao, and R. Korechoff, "Mask Design for the Space Interferometry Mission Internal Metrology," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optica Publishing Group, 2005), paper JWB1.

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Abstract

Heterodyne laser interferometers are used to measure the changes in optical path length of the arms of stellar interferometers. Numerical diffraction analysis is used to design masks, constrained by diffraction, crosstalk, and power loss requirements.

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