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Conferences > CLEO > 2003 > CWA > CWA42
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference
  • Technical Digest (Optica Publishing Group, 2003),
  • paper CWA42

Vertical Integration of Silica and Electro-optic Polymer Waveguides using Grayscale Lithography

Daniel H. Chang, Talal Azfar, Harold R. Fetterman, Cheng Zhang, and William H. Steier

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Abstract

A vertical transition between silica and elecro-optic polymer (CX-2) planar waveguides is fabricated using grayscale lithography, with low loss and good simulation match. This first demonstration combining silica and CX2 offers the potential for a new class of hybrid active devices.

© 2003 Optical Society of America

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