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Conferences > CLEO > 2003 > CThM > CThM34
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference
  • Technical Digest (Optica Publishing Group, 2003),
  • paper CThM34

New low temperature femto-second laser annealing method for TFT fabrication technology

Alexei K. Zaitsev, Yi-Chao Wang, Ci-Ling Pan, and Jia-Min Shieh

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Abstract

Described new method of silicon laser annealing is based on sequential lateral solidification technique, uses femto-second high power laser and has several advantages (large annealed boundary free area, lower temperature) compared to other annealing methods.

© 2003 Optical Society of America

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