EUV conversion efficiency of laser irradiated water droplets for lithography

Stefan Düsterer; Wolfgang Ziegler; Christian Ziener; Heinrich Schwoerer; Roland Sauerbrey

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2001),
paper CWG2

EUV conversion efficiency of laser irradiated water droplets for lithography

Stefan Düsterer, Wolfgang Ziegler, Christian Ziener, Heinrich Schwoerer, and Roland Sauerbrey

Conference on Lasers and Electro-Optics 2001

Baltimore, Maryland United States
6–10 May 2001
ISBN: 1-55752-662-1

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Novel Laser Sources (CWG)

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S. Düsterer, W. Ziegler, C. Ziener, H. Schwoerer, and R. Sauerbrey, "EUV conversion efficiency of laser irradiated water droplets for lithography," in Conference on Lasers and Electro-Optics, J. Kafka, K. Vahala, R. Williamson, and A. Willner, eds., OSA Technical Digest (Optica Publishing Group, 2001), paper CWG2.

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Abstract

To provide lithographic tools for semiconductor industry which requires the continuing decrease of the smallest structures on computer chips, new technologies have to be investigated. A promising approach is the 13 nm extreme ultraviolet lithography (EUVL).

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