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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2000),
  • paper CThB3

The droplet laser plasma source for EUV lithography

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Abstract

Extreme ultraviolet lithography (EUVL) is now considered the leading technology to replace optical lithography at the 100-nm node for the production of advanced computer chips later this decade.1

© 2000 Optical Society of America

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