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  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2000),
  • paper CMX3

Laser-MBE deposition of epitaxial oxides and nitrides using ultrafast laser pulses

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Abstract

A laser-MBE system, operating at a base pressure of 5×10−9 Torr, is used in conjunction with a 10-Hz ultrafast laser facility for monolayer deposition of various oxide and nitride thin films under laser-induced gas discharge conditions.

© 2000 Optical Society of America

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