Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO > 2000 > CFK > CFK4
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2000),
  • paper CFK4

Dynamics of material removal in ultrashort laser ablation of dielectrics

R. Stoian, D. Ashkenasi, A. Rosenfeld, M. Lorenz, and E.E.B. Campbell

Not Accessible

Your library or personal account may give you access

Abstract

Non thermal and thermal processes are evidenced in near infrared, ultrashort (sub-ps and ps) pulse laser ablation of wide band-gap dielectrics with accent on the etch phases in case of laser irradiated sapphire (c-Al2O3) depending on the laser parameters controlling the ablation process: number of pulses, laser fluence and pulse duration.

© 2000 Optical Society of America

PDF Article
More Like This
Non-thermal and thermal processes in the ultra-short laser ablation of sapphire

R. Stoian, M. Lorenz, D. Ashkenasi, A. Rosenfeld, and E.E.B. Campbell
CThC1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1999

Ultrashort laser-solid interaction: ionisation, absorption, and ablation

E.G. Gamaly and A. V. Rode
QMD6 International Quantum Electronics Conference (IQEC) 2000

Ultrashort Pulse Laser Ablation of Dielectric Materials: Experiments and Modeling

Kristian Wædegaard, Bjarke H. Christensen, Mehrnaz N. Christensen, and Peter Balling
CM5_1 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2011

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use