Application of nanoimprint lithography in nanoscale GaAs MSM photodetectors

Steven J. Schablitsky; Zhaoning Yu; Stephen Y. Chou

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1999),
paper CTuI2

Application of nanoimprint lithography in nanoscale GaAs MSM photodetectors

Steven J. Schablitsky, Zhaoning Yu, and Stephen Y. Chou

Conference on Lasers and Electro-Optics 1999

Baltimore, Maryland United States
23–26 May 1999
ISBN: 1-55752-570-6

From the session
Metal-Semiconductor-Metal Photodiode Fabrication and Gallium Nitride Characterization (CTuI)

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S. J. Schablitsky, Z. Yu, and S. Y. Chou, "Application of nanoimprint lithography in nanoscale GaAs MSM photodetectors," in Conference on Lasers and Electro-Optics, C. Chang-Hasnain, W. Knox, J. Kafka, and K. Vahala, eds., OSA Technical Digest (Optica Publishing Group, 1999), paper CTuI2.

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Abstract

As shown, the dark currents at pressures of 300 and 600 psi are nearly the same.

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