157-nm photosensitivity in germanosilicate planar waveguides

Sola Ness; Peter R. Herman

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1999),
paper CTuE3

157-nm photosensitivity in germanosilicate planar waveguides

Sola Ness and Peter R. Herman

Conference on Lasers and Electro-Optics 1999

Baltimore, Maryland United States
23–26 May 1999
ISBN: 1-55752-570-6

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Fiber and Waveguide Devices (CTuE)

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S. Ness and P. R. Herman, "157-nm photosensitivity in germanosilicate planar waveguides," in Conference on Lasers and Electro-Optics, C. Chang-Hasnain, W. Knox, J. Kafka, and K. Vahala, eds., OSA Technical Digest (Optica Publishing Group, 1999), paper CTuE3.

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Abstract

Ultraviolet lasers ire widely employed in defining miniature photonic structure inside the con of optical waveguides through laser-induced index-of-refract ion changes.

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