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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • (Optica Publishing Group, 1998),
  • paper LTuB2

Excimer lasers for DUV lithography

Open Access Open Access

Abstract

The use of KrF and ArF excimer lasers as exposure sources for deep ultraviolet (DUV) lithography is discussed.

© 1998 Optical Society of America

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