Source technologies for extreme ultraviolet lithography

Glenn D. Kubiak

Conference on Lasers and Electro-Optics
(Optica Publishing Group, 1998),
paper LTuA3

Source technologies for extreme ultraviolet lithography

Glenn D. Kubiak

Conference on Lasers and Electro-Optics 1998

San Francisco, California United States
3–8 May 1998
ISBN: 1-55752-540-4

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Lithography: I (LTuA)

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G. D. Kubiak, "Source technologies for extreme ultraviolet lithography," in Conference on Lasers and Electro-Optics, D. Scifres and A. Weiner, eds., (Optica Publishing Group, 1998), paper LTuA3.

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Abstract

Extreme ultraviolet lithography (EUVL) is being developed for the production of integrated circuits with critical dimension (CD) ≤0.l μm.

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