Maximizing the finesse in a high finesse interferometer

J. K. Brasseur; K. S. Repasky; J. L. Carlsten

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1997),
paper CTuP51

Maximizing the finesse in a high finesse interferometer

J. K. Brasseur, K. S. Repasky, and J. L. Carlsten

Conference on Lasers and Electro-Optics 1997

Baltimore, Maryland United States
18–23 May 1997
ISBN: 1-55752-498-8

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CLEO Poster Session: 1 (CTuP)

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J. K. Brasseur, K. S. Repasky, and J. L. Carlsten, "Maximizing the finesse in a high finesse interferometer," in Conference on Lasers and Electro-Optics, D. Killinger, G. Valley, C. Chang-Hasnain, and W. Knox, eds., Vol. 11 of OSA Technical Digest (Optica Publishing Group, 1997), paper CTuP51.

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Abstract

Recent developments in coating technology have made it possible to construct high finesse interferometers¹ (HFIs) that can measure narrow linewidths while maintaining a large free spectral range.

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