An all-solid-state, deep-UV laser source at 193 nm

Wen-Bin Yan; Thomas F. Steckroat; Ricky A. Frost; John C. Walling; Donald F. Heller

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1997),
paper CFF5

An all-solid-state, deep-UV laser source at 193 nm

Wen-Bin Yan, Thomas F. Steckroat, Ricky A. Frost, John C. Walling, and Donald F. Heller

Conference on Lasers and Electro-Optics 1997

Baltimore, Maryland United States
18–23 May 1997
ISBN: 1-55752-498-8

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Laser Sources and Systems (CFF)

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W. Yan, T. F. Steckroat, R. A. Frost, J. C. Walling, and D. F. Heller, "An all-solid-state, deep-UV laser source at 193 nm," in Conference on Lasers and Electro-Optics, D. Killinger, G. Valley, C. Chang-Hasnain, and W. Knox, eds., Vol. 11 of OSA Technical Digest (Optica Publishing Group, 1997), paper CFF5.

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Abstract

Few convenient tunable deep-UV laser sources exist today for applications such as photodissodation and photoicmizalion, laser exeitaLion, laser diagnostics, and laser spectroscopy.

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