Abstract
After more than a decade of research, KrF excimer laser sources are finally being introduced into leading edge manufacturing equipment for integrated circuit lithography at 0.25-0.30 μm feature sizes. The current industry consensus is that the most likely path for advanced IC lithograpy over the coming decade will involve excimer laser sources and projection optical systems extending all the way down to about 0.13 μm feature size. Such technology will be used to manufacture 4 Gbit memory chips, microprocessors, and other integrated circuit systems with upwards of one billion transistors on a chip.
© 1996 Optical Society of America
PDF ArticleMore Like This
Andrew C. Tam
PT2 Advanced Solid State Lasers (ASSL) 1996
Glenn D. Kubiak, Daniel A. Tichenor, and Richard H. Stulen
TuP2 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 1995
Uwe Stamm, Imtiaz Ahmad, Frank Flohrer, Kai Gäbel, Sven Götze, Jürgen Kleinschmidt, Diethard Klöpfel, Peter Köhler, Vladimir Korobotchko, Jens Ringling, Guido Schriever, and
CThB1 Conference on Lasers and Electro-Optics (CLEO:S&I) 2002