Abstract

A new interferometric system has been developed, which is designed to meet the needs of high-end IC manufacturing in the immediate future. High-precision positional measurements during the lithographic exposures for IC manufacturing are critical to the ability to fabricate fine geometry circuits at high yield. The positional measurements are provided by high-performance interferometers, which are limited in performance principally by the turbulent air inside the lithographic exposure tool (a stepper).

© 1996 Optical Society of America