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Conferences > CLEO > 1996 > CThK > CThK32
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1996),
  • paper CThK32

Impact of the residual facet reflectivity on beam profile filamentation in semiconductor laser amplifiers

Zheng Dai, Rainer Michalzik, Peter Unger, and Karl Joachim Ebeling

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Abstract

High-power semiconductor laser traveling wave amplifiers have been intensively studied recently. From the experiments it is known that amplifiers with imperfectly antireflection-(AR) coated facets tend towards filamentations of the output beam. This phenomenon is supposed to be due to the interference between counterpropagating beams, their amplification and reflective feedback1 and has been described theoretically in an approximative manner by summing up the intensities of the multiply reflected beams.2

© 1996 Optical Society of America

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