Abstract
High-repetition-rate operation for excimer lasers is useful in industry for, e.g., semiconductor processes. KrF, XeF, and XeCl excimer lasers have been operated at repetition rates over 1 kHz with a large gas-flow system to sweep the heated gas out of the discharge region immediately. High-repetition rate operation for an ArF excimer laser is especially difficult because of this laser’s unstable discharge and small gain.
© 1995 Optical Society of America
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