Abstract

The x-ray spectral region from 0.8-1.2 nm is a useful source of radiation for proximity mask photolithography systems where the goal is to reach feature sizes as small as 0.18 pm in a production machine. Presently high average power x-ray output can be produced by synchrotrons, gas puff plasma pinch generators, or laser heated plasmas. The laser driven x-ray source is particularly attractive for commercial manufacturing based on the power and position stability of its output, the x-ray wavelength diversity available by tailoring the incident laser irradiance and the target material, and its relatively compact size. In this paper we describe a prototype of a high average power x-ray point source pumped by a Nd:glass high beam quality laser amplifier system. Average x-ray powers of 6 W in the spectral range of 0.8-1.2 nm can be delivered in steady-state, continuous operation. The output can also be configured for 2-second bursts of 20 W average x-ray power with ~5 seconds between each burst.

© 1994 Optical Society of America