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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1994),
  • paper CThI25

Two-photon absorption in ultraviolet window materials at 193 nm

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Abstract

Recent developments of high-brightness ArF excimer laser systems, which can produce ultrashort pulses with optical peak powers with gigawatt level have focussed our interest on the investigation of intensify dependent transmission properties of materials commonly used for ultraviolet optics, namely MgF2, CaF2, BaF2 and fused silica. In contrast to KrF and XeCl systems the two-photon energy for 193 nm photons (12,8 eV) lies well above the band gaps of all these window materials. Previous studies of intensity dependent transmission in such materials were restricted on wavelengths above 245 nm.1-3 Thus the knowledge of the nonlinear transmission properties of these materials at high-intensity 193 nm irradiation is necessary.

© 1994 Optical Society of America

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