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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1994),
  • paper CMA5

High power diffraction-limited reactive-ion-etched unstable resonator diode lasers

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Abstract

Several techniques have recently been examined for fabricating unstable resonator diode lasers, namely reactive-ion-etching (RIE) and ion-beam-milling to create curved cavity mirrors, epitaxial regrowth to effect divergent lenses within the gain stripe, and cavity micro-heating to thermally induce index change. Of these, the last three approaches have demonstrated nearly diffraction-limited output at high powers, but to our knowledge, such ideal characteristics have not been realized with the highly manufacturable RIE process. We have fabricated wide-stripe unstable resonators using RIE and have measured M2 beam quality values nearly equivalent to those obtainable from narrow-stripe diode lasers.

© 1994 Optical Society of America

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