High efficiency operation for an x-ray pre-ionized discharge-pumped ArF excimer laser

H. Sekita; H. Sekita; Y. Kajiki; Y. Kajiki; S. Ito; S. Ito; K. Hotta; K. Hotta

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1993),
paper CThI4

High efficiency operation for an x-ray pre-ionized discharge-pumped ArF excimer laser

H. Sekita, Y. Kajiki, S. Ito, and K. Hotta

Conference on Lasers and Electro-Optics 1993

Baltimore, Maryland United States
2–7 May 1993
ISBN: 1-55752-189-1

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Excimer Lasers (CThI)

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H. Sekita, Y. Kajiki, S. Ito, and K. Hotta, "High efficiency operation for an x-ray pre-ionized discharge-pumped ArF excimer laser," in Conference on Lasers and Electro-Optics, A. Glass, T. Hsu, T. Deutsch, and J. Goldman, eds., Vol. 10 of OSA Technical Digest (Optica Publishing Group, 1993), paper CThI4.

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Abstract

The ArF excimer laser provides opportunities for exciting applications such as photochemical vapor deposition of high-Tc superconducting film. Its long time operation without maintenance is necessary for the industrial use. The x-ray pre-ionization is applicable to the long gas lifetime excimer lasers, because it generates neither gas contamination nor metal dust.¹

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