Abstract

The advance of very-large-scale-integrated circuitry has resulted in an increasingly complex design and fabrication process. Conventional photolithography-based processes become inconvenient, inefficient, and expensive when there is a need to correct prototype chips locally, to fabricate custom-low production run devices, and to produce massive scale interconnection among chips. Laser-direct-writing¹ or laser pantography (LP) offers one possible method for achieving these goals.

© 1992 Optical Society of America