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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1989),
  • paper THD1

Kinetics of polymer photoablation

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Abstract

The etch rates of a dozen polymers were "measured with a quartz crystal microbaiance technique at various wavelengths (193, 248, and 851 nm) of an excimer laser. The new model of the moving interface,2 which takes into account (1) the high speed of the phenomenon and (2) the screening of the incident beam by the ablation products, allows the measurement of k (ablation rate constant) and β (screening coefficient). In this model, the interface moves at a speed v = K(I0e βx It), where I0 is the laser intensity, x is the position of the interface at time t and It, is the ablation threshold.

© 1989 Optical Society of America

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