Abstract

Excimer lasers allow generation of high-power radiation at a set of wavelengths in the UV region, which can be used as an optical source for photolithography to very high resolution. Unfortunately, the regular optical system used in a photolithographic system is limited to transmission light waves with a wavelength larger than 0.35 μm. For λ < 0.3 μm, the system has to be specially designed and is expensive.

© 1988 Optical Society of America