Abstract
Earlier work1–3 on the etching of an organic polymer by UV laser radiation has emphasized the depth of the etching/pulse If as a function of fluence F. In this work, the If vs InF curves for polymethyl methacrylate (PMMA) have been ex- tended over a larger range of fluences at 193 and 24B nm (Fig. 1). At the same time, the quantum yields for methyl methacrylate (MMA), the principal polyatomic product from PMMA, were also determined (Fig. 2). The quantum yields of MMA at 248 nm were tenfold smaller than at 193 nm and are, therefore, not inclued in Fig. 2. Etch curves for bovine cornea1 which were determined from laser exposure in vitro are shown in Fig. 3.
© 1985 Optical Society of America
PDF ArticleMore Like This
C. S. GUDEMAN, J. DONELON, and FAHFU HO
THM16 Conference on Lasers and Electro-Optics (CLEO:S&I) 1985
YEHOSHUA KALISKY and D. J. WILLIAMS
WC3 Conference on Lasers and Electro-Optics (CLEO:S&I) 1985
G. Koren and J. T. C. Yeh
ThR11 Conference on Lasers and Electro-Optics (CLEO:S&I) 1984