Abstract
Phase conjugate mirrors are of interest in photolithography for projecting complex images over a large field. The use of conventional optical elements, such as lenses and mirrors, to project micron-type features over an area of ~1 cm3 requires high-quality, extremely complex, and expensive components. On the other hand, use of phase conjugate mirrors for image projection1 is potentially cheaper, less complex, and capable of higher resolution than more conventional techniques.
© 1985 Optical Society of America
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