Abstract
The F2 dimer laser, the most powerful laser in the VUV spectral region, is attractive for high-resolution lithography in very-large-scale integration (VLSI) processing1 and photochemical applications.2 The F2 laser oscillation at 157 nm is obtainable as well with rare gas halide lasers by using commercially available discharge laser devices.3 However, the output energies of the order of 10 mj produced by the discharge devices are too low for practical applications of the F2 laser.
© 1985 Optical Society of America
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